APA Zitierstil

Wang, S., Zhao, X., Zhang, C., Yang, Y., Liang, J., Ni, Y., . . . Liu, Y. (2021). Suppressing Interface Strain for Eliminating Double-Slope Behaviors: Towards Ideal Conformable Polymer Field-Effect Transistors. Advanced materials (Deerfield Beach, Fla.), 33(44), . https://doi.org/10.1002/adma.202101633

Chicago Zitierstil

Wang, Shuya, et al. "Suppressing Interface Strain for Eliminating Double-Slope Behaviors: Towards Ideal Conformable Polymer Field-Effect Transistors." Advanced Materials (Deerfield Beach, Fla.) 33, no. 44 (2021). https://dx.doi.org/10.1002/adma.202101633.

MLA Zitierstil

Wang, Shuya, et al. "Suppressing Interface Strain for Eliminating Double-Slope Behaviors: Towards Ideal Conformable Polymer Field-Effect Transistors." Advanced Materials (Deerfield Beach, Fla.), vol. 33, no. 44, 2021.