Thermal optimization of a high-heat-load double-multilayer monochromator
Finite-element analysis is used to study the thermal deformation of a multilayer mirror due to the heat load from the undulator beam at a low-emittance synchrotron source, specifically the ESRF-EBS upgrade beamline EBSL-2. The energy bandwidth of the double-multilayer monochromator is larger than th...
Description complète
Détails bibliographiques
| Publié dans: | Journal of synchrotron radiation. - 1994. - 28(2021), Pt 5 vom: 01. Sept., Seite 1423-1436
|
|---|
| Auteur principal: |
Brumund, Philipp
(Auteur) |
|---|
| Autres auteurs: |
Reyes-Herrera, Juan,
Morawe, Christian,
Dufrane, Thomas,
Isern, Helena,
Brochard, Thierry,
Sánchez Del Río, Manuel,
Detlefs, Carsten |
|---|
| Format: | Article en ligne
|
|---|
| Langue: | English |
|---|
| Publié: |
2021
|
|---|
| Accès à la collection: | Journal of synchrotron radiation
|
|---|
| Sujets: | Journal Article
X-ray optics
finite-element analysis
high-heat-load optics
multilayer monochromator |
|---|