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231225s2021 xx |||||o 00| ||eng c |
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|a 10.1021/acs.chemmater.1c00375
|2 doi
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|a pubmed24n1094.xml
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|a (DE-627)NLM328214884
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|a (NLM)34276132
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|a DE-627
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|c DE-627
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|a eng
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|a Dey, Sunita
|e verfasserin
|4 aut
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|a Structural Evolution of Layered Manganese Oxysulfides during Reversible Electrochemical Lithium Insertion and Copper Extrusion
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|c 2021
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Revised 20.07.2021
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2021 The Authors. Published by American Chemical Society.
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|a The electrochemical lithiation and delithiation of the layered oxysulfide Sr2MnO2Cu4-δS3 has been investigated by using a combination of in situ powder X-ray diffraction and ex situ neutron powder diffraction, X-ray absorption and 7Li NMR spectroscopy, together with a range of electrochemical experiments. Sr2MnO2Cu4-δS3 consists of [Sr2MnO2] perovskite-type cationic layers alternating with highly defective antifluorite-type [Cu4-δS3] (δ ≈ 0.5) anionic layers. It undergoes a combined displacement/intercalation (CDI) mechanism on reaction with Li, where the inserted Li replaces Cu, forming Li4S3 slabs and Cu+ is reduced and extruded as metallic particles. For the initial 2-3% of the first discharge process, the vacant sites in the sulfide layer are filled by Li; Cu extrusion then accompanies further insertion of Li. Mn2.5+ is reduced to Mn2+ during the first half of the discharge. The overall charging process involves the removal of Li and re-insertion of Cu into the sulfide layers with re-oxidation of Mn2+ to Mn2.5+. However, due to the different diffusivities of Li and Cu, the processes operating on charge are quite different from those operating during the first discharge: charging to 2.75 V results in the removal of most of the Li, little reinsertion of Cu, and good capacity retention. A charge to 3.75 V is required to fully reinsert Cu, which results in significant changes to the sulfide sublattice during the following discharge and poor capacity retention. This detailed structure-property investigation will promote the design of new functional electrodes with improved device performance
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|a Journal Article
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|a Zeng, Dongli
|e verfasserin
|4 aut
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|a Adamson, Paul
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Cabana, Jordi
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Indris, Sylvio
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Lu, Jingyu
|e verfasserin
|4 aut
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|a Clarke, Simon J
|e verfasserin
|4 aut
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| 700 |
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|a Grey, Clare P
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Chemistry of materials : a publication of the American Chemical Society
|d 1998
|g 33(2021), 11 vom: 08. Juni, Seite 3989-4005
|w (DE-627)NLM098194763
|x 0897-4756
|7 nnns
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| 773 |
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|g volume:33
|g year:2021
|g number:11
|g day:08
|g month:06
|g pages:3989-4005
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|u http://dx.doi.org/10.1021/acs.chemmater.1c00375
|3 Volltext
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