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231225s2021 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202006836
|2 doi
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|a pubmed24n1088.xml
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|a (DE-627)NLM326443320
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|a (NLM)34096113
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Zhou, Dikui
|e verfasserin
|4 aut
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|a Pattern-Potential-Guided Growth of Textured Macromolecular Films on Graphene/High-Index Copper
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|c 2021
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 22.07.2021
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2021 Wiley-VCH GmbH.
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|a Macromolecular films are crucial functional materials widely used in the fields of mechanics, electronics, optoelectronics, and biology, due to their superior properties of chemical stability, small density, high flexibility, and solution-processing ability. Their electronic and mechanical properties, however, are typically much lower than those of crystalline materials, as the macromolecular films have no long-range structural ordering. The state-of-the-art for producing highly ordered macromolecular films is still facing a great challenge due to the complex interactions between adjacent macromolecules. Here, the growth of textured macromolecular films on a designed graphene/high-index copper (Cu) surface is demonstrated. This successful growth is driven by a patterned potential that originates from the different amounts of charge transfer between the graphene and Cu surfaces with, alternately, terraces and step edges. The textured films exhibit a remarkable improvement in remnant ferroelectric polarization and fracture strength. It is also demonstrated that this growth mechanism is universal for different macromolecules. As meter-scale graphene/high-index Cu substrates have recently become available, the results open a new regime for the production and applications of highly ordered macromolecular films with obvious merits of high production and low cost
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|a Journal Article
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|a graphene/high-index Cu substrates
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|a high ordering
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|a large scale film growth
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|a macromolecular films
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|a patterned potentials
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|a Zhang, Zhihong
|e verfasserin
|4 aut
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1 |
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|a Zhu, Yihan
|e verfasserin
|4 aut
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1 |
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|a Xiao, Yiqun
|e verfasserin
|4 aut
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1 |
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|a Ding, Qingqing
|e verfasserin
|4 aut
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1 |
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|a Ruan, Luoyuan
|e verfasserin
|4 aut
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1 |
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|a Sun, Yiran
|e verfasserin
|4 aut
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1 |
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|a Zhang, Zhibin
|e verfasserin
|4 aut
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1 |
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|a Zhu, Chongzhi
|e verfasserin
|4 aut
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1 |
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|a Chen, Zongping
|e verfasserin
|4 aut
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1 |
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|a Wu, Yongjun
|e verfasserin
|4 aut
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1 |
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|a Huang, Yuhui
|e verfasserin
|4 aut
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1 |
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|a Sheng, Guan
|e verfasserin
|4 aut
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1 |
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|a Li, Jixue
|e verfasserin
|4 aut
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1 |
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|a Yu, Dapeng
|e verfasserin
|4 aut
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|a Wang, Enge
|e verfasserin
|4 aut
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1 |
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|a Ren, Zhaohui
|e verfasserin
|4 aut
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|a Lu, Xinhui
|e verfasserin
|4 aut
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|a Liu, Kaihui
|e verfasserin
|4 aut
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|a Han, Gaorong
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 33(2021), 29 vom: 15. Juli, Seite e2006836
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:33
|g year:2021
|g number:29
|g day:15
|g month:07
|g pages:e2006836
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|u http://dx.doi.org/10.1002/adma.202006836
|3 Volltext
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|a GBV_ILN_350
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|a AR
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|d 33
|j 2021
|e 29
|b 15
|c 07
|h e2006836
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