Multi-State Heterojunction Transistors Based on Field-Effect Tunneling-Transport Transitions

© 2021 Wiley-VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 33(2021), 29 vom: 01. Juli, Seite e2101243
1. Verfasser: Lim, Dong Un (VerfasserIn)
Weitere Verfasser: Jo, Sae Byeok, Kang, Joohoon, Cho, Jeong Ho
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2021
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article PTCDI field-effect transistors indium-gallium-zinc oxide multivalued logic tunneling vertical heterostructure
LEADER 01000naa a22002652 4500
001 NLM326105166
003 DE-627
005 20231225193852.0
007 cr uuu---uuuuu
008 231225s2021 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.202101243  |2 doi 
028 5 2 |a pubmed24n1086.xml 
035 |a (DE-627)NLM326105166 
035 |a (NLM)34062014 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Lim, Dong Un  |e verfasserin  |4 aut 
245 1 0 |a Multi-State Heterojunction Transistors Based on Field-Effect Tunneling-Transport Transitions 
264 1 |c 2021 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Revised 22.07.2021 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a © 2021 Wiley-VCH GmbH. 
520 |a A monolithic ternary logic transistor based on a vertically stacked double n-type semiconductor heterostructure is presented. Incorporation of the organic heterostructure into the conventional metal-oxide-semiconductor field-effect transistor (MOSFET) architecture induces the generation of stable multiple logic states in the device; these states can be further optimized to be equiprobable and distinctive, which are the most desirable and requisite properties for multivalued logic devices. A systematic investigation reveals that the electrical properties of the device are governed by not only the conventional field-effect charge transport but also the field-effect charge tunneling at the heterointerfaces, and thus, an intermediate state can be finely tuned by independently controlling the transition between the onsets of these two mechanisms. The achieved device performance agrees with the results of a numerical simulation based on a pseudo-metal-insulator-metal model; the obtained findings therefore provide rational criteria for material selection in a simple energetic perspective. The operation of various ternary logic circuits based on the optimized multistate heterojunction transistors, including the NMIN and NMAX gates, is also demonstrated 
650 4 |a Journal Article 
650 4 |a PTCDI 
650 4 |a field-effect transistors 
650 4 |a indium-gallium-zinc oxide 
650 4 |a multivalued logic 
650 4 |a tunneling 
650 4 |a vertical heterostructure 
700 1 |a Jo, Sae Byeok  |e verfasserin  |4 aut 
700 1 |a Kang, Joohoon  |e verfasserin  |4 aut 
700 1 |a Cho, Jeong Ho  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 33(2021), 29 vom: 01. Juli, Seite e2101243  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:33  |g year:2021  |g number:29  |g day:01  |g month:07  |g pages:e2101243 
856 4 0 |u http://dx.doi.org/10.1002/adma.202101243  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 33  |j 2021  |e 29  |b 01  |c 07  |h e2101243