Temperature-Dependent Electronic Ground-State Charge Transfer in van der Waals Heterostructures

© 2021 The Authors. Advanced Materials published by Wiley-VCH GmbH.

Détails bibliographiques
Publié dans:Advanced materials (Deerfield Beach, Fla.). - 1998. - 33(2021), 29 vom: 26. Juli, Seite e2008677
Auteur principal: Park, Soohyung (Auteur)
Autres auteurs: Wang, Haiyuan, Schultz, Thorsten, Shin, Dongguen, Ovsyannikov, Ruslan, Zacharias, Marios, Maksimov, Dmitrii, Meissner, Matthias, Hasegawa, Yuri, Yamaguchi, Takuma, Kera, Satoshi, Aljarb, Areej, Hakami, Mariam, Li, Lain-Jong, Tung, Vincent, Amsalem, Patrick, Rossi, Mariana, Koch, Norbert
Format: Article en ligne
Langue:English
Publié: 2021
Accès à la collection:Advanced materials (Deerfield Beach, Fla.)
Sujets:Journal Article 2D semiconductors MoS2 charge transfer electron-phonon coupling molecular dopants photoelectron spectroscopy
Description
Résumé:© 2021 The Authors. Advanced Materials published by Wiley-VCH GmbH.
Electronic charge rearrangement between components of a heterostructure is the fundamental principle to reach the electronic ground state. It is acknowledged that the density of state distribution of the components governs the amount of charge transfer, but a notable dependence on temperature is not yet considered, particularly for weakly interacting systems. Here, it is experimentally observed that the amount of ground-state charge transfer in a van der Waals heterostructure formed by monolayer MoS2 sandwiched between graphite and a molecular electron acceptor layer increases by a factor of 3 when going from 7 K to room temperature. State-of-the-art electronic structure calculations of the full heterostructure that accounts for nuclear thermal fluctuations reveal intracomponent electron-phonon coupling and intercomponent electronic coupling as the key factors determining the amount of charge transfer. This conclusion is rationalized by a model applicable to multicomponent van der Waals heterostructures
Description:Date Revised 13.10.2024
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.202008677