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231225s2021 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202008779
|2 doi
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|a pubmed25n1083.xml
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|a (DE-627)NLM325072337
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|a (NLM)33955078
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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| 100 |
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|a Stern, Chen
|e verfasserin
|4 aut
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| 245 |
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|a Enhancing Light-Matter Interactions in MoS2 by Copper Intercalation
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|c 2021
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 13.10.2024
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2021 The Authors. Advanced Materials published by Wiley-VCH GmbH.
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|a The intercalation of layered compounds opens up a vast space of new host-guest hybrids, providing new routes for tuning the properties of materials. Here, it is shown that uniform and continuous layers of copper can be intercalated within the van der Waals gap of bulk MoS2 resulting in a unique Cu-MoS2 hybrid. The new Cu-MoS2 hybrid, which remains semiconducting, possesses a unique plasmon resonance at an energy of ≈1eV, giving rise to enhanced optoelectronic activity. Compared with high-performance MoS2 photodetectors, copper-enhanced devices are superior in their spectral response, which extends into the infrared, and also in their total responsivity, which exceeds 104 A W-1 . The Cu-MoS2 hybrids hold promise for supplanting current night-vision technology with compact, advanced multicolor night vision
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|a Journal Article
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|a MoS2
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|a copper intercalation
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| 650 |
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4 |
|a photodetectors
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| 700 |
1 |
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|a Twitto, Avraham
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Snitkoff, Rifael Z
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Fleger, Yafit
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Saha, Sabyasachi
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Boddapati, Loukya
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Jain, Akash
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wang, Mengjing
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Koski, Kristie J
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Deepak, Francis Leonard
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Ramasubramaniam, Ashwin
|e verfasserin
|4 aut
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| 700 |
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|a Naveh, Doron
|e verfasserin
|4 aut
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| 773 |
0 |
8 |
|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 33(2021), 23 vom: 31. Juni, Seite e2008779
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnas
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| 773 |
1 |
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|g volume:33
|g year:2021
|g number:23
|g day:31
|g month:06
|g pages:e2008779
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| 856 |
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|u http://dx.doi.org/10.1002/adma.202008779
|3 Volltext
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