Experimental Demonstration of Dual-Band Nano-Electromechanical Valley-Hall Topological Metamaterials

© 2021 Wiley-VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 33(2021), 10 vom: 19. März, Seite e2006521
1. Verfasser: Ma, Jingwen (VerfasserIn)
Weitere Verfasser: Xi, Xiang, Sun, Xiankai
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2021
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article integrated phononic circuits nano-electromechanical systems quantum valley-Hall effect topological insulators valley-momentum locking
Beschreibung
Zusammenfassung:© 2021 Wiley-VCH GmbH.
Suppression of undesired backscattering of very-high-frequency elastic signals has been considered as a grand challenge in integrated phononic circuits. Originating from condensed-matter physics, valley-Hall topological insulators provide an intriguing strategy to overcome this challenge. To date, phononic valley-Hall topological insulators have been demonstrated only in bulk acoustic and mechanical systems operating at relatively low frequencies. Here, an integrated nano-electromechanical valley-Hall topological insulator operating in the very-high-frequency regime is experimentally realized. Valley kink states that are backscattering-immune against sharp bends and exhibit the "valley-momentum locking" effect simultaneously in the fundamental (≈60 MHz) and second-order (≈120 MHz) frequency bands are demonstrated. It is further shown that the propagation directions of these dual-band valley kink states are always locked to their valley pseudospins. The results not only enable various applications in very-high-frequency integrated phononic circuits with enhanced robustness and capacity, but also open the door to experimental exploration of mechanical nonlinearities, particularly those involving the fundamental and second-order frequencies, in topologically nontrivial nanostructures
Beschreibung:Date Revised 10.03.2021
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.202006521