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231225s2021 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202005256
|2 doi
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|a eng
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| 100 |
1 |
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|a Chen, Fang
|e verfasserin
|4 aut
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|a Atomic-Level Charge Separation Strategies in Semiconductor-Based Photocatalysts
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|c 2021
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|a Text
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|a ƒaComputermedien
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|a ƒa Online-Ressource
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|a Date Revised 10.03.2021
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2021 Wiley-VCH GmbH.
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|a Semiconductor-based photocatalysis as a productive technology furnishes a prospective solution to environmental and renewable energy issues, but its efficiency greatly relies on the effective bulk and surface separation of photoexcited charge carriers. Exploitation of atomic-level strategies allows in-depth understanding on the related mechanisms and enables bottom-up precise design of photocatalysts, significantly enhancing photocatalytic activity. Herein, the advances on atomic-level charge separation strategies toward developing robust photocatalysts are highlighted, elucidating the fundamentals of charge separation and transfer processes and advanced probing techniques. The atomic-level bulk charge separation strategies, embodied by regulation of charge movement pathway and migration dynamic, boil down to shortening the charge diffusion distance to the atomic-scale, establishing atomic-level charge transfer channels, and enhancing the charge separation driving force. Meanwhile, regulating the in-plane surface structure and spatial surface structure are summarized as atomic-level surface charge separation strategies. Moreover, collaborative strategies for simultaneous manipulation of bulk and surface photocharges are also introduced. Finally, the existing challenges and future prospects for fabrication of state-of-the-art photocatalysts are discussed on the basis of a thorough comprehension of atomic-level charge separation strategies
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|a Journal Article
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|a Review
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|a atomic-level strategies
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|a bulk charge separation
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| 650 |
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4 |
|a charge kinetics
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| 650 |
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|a photocatalysis
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| 650 |
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4 |
|a surface charge separation
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| 700 |
1 |
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|a Ma, Tianyi
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhang, Tierui
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhang, Yihe
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Huang, Hongwei
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 33(2021), 10 vom: 26. März, Seite e2005256
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnas
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| 773 |
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|g volume:33
|g year:2021
|g number:10
|g day:26
|g month:03
|g pages:e2005256
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|u http://dx.doi.org/10.1002/adma.202005256
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