Substrate-Dependent Study of Chain Orientation and Order in Alkylphosphonic Acid Self-Assembled Monolayers for ALD Blocking

For years, many efforts in area selective atomic layer deposition (AS-ALD) have focused on trying to achieve high-quality self-assembled monolayers (SAMs), which have been shown by a number of studies to be effective for blocking deposition. Herein, we show that in some cases where a densely packed...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 36(2020), 43 vom: 03. Nov., Seite 12849-12857
1. Verfasser: Bobb-Semple, Dara (VerfasserIn)
Weitere Verfasser: Zeng, Li, Cordova, Isvar, Bergsman, David S, Nordlund, Dennis, Bent, Stacey F
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2020
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article