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231225s2020 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202002075
|2 doi
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|a pubmed24n1481.xml
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|a (DE-627)NLM315024275
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|a (NLM)32930431
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Jeong, Seong-Yong
|e verfasserin
|4 aut
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|a Rational Design of Semiconductor-Based Chemiresistors and their Libraries for Next-Generation Artificial Olfaction
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|c 2020
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Completed 24.07.2024
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|a Date Revised 24.07.2024
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a © 2020 The Authors. Published by Wiley-VCH GmbH.
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|a Artificial olfaction based on gas sensor arrays aims to substitute for, support, and surpass human olfaction. Like mammalian olfaction, a larger number of sensors and more signal processing are crucial for strengthening artificial olfaction. Due to rapid progress in computing capabilities and machine-learning algorithms, on-demand high-performance artificial olfaction that can eclipse human olfaction becomes inevitable once diverse and versatile gas sensing materials are provided. Here, rational strategies to design a myriad of different semiconductor-based chemiresistors and to grow gas sensing libraries enough to identify a wide range of odors and gases are reviewed, discussed, and suggested. Key approaches include the use of p-type oxide semiconductors, multinary perovskite and spinel oxides, carbon-based materials, metal chalcogenides, their heterostructures, as well as heterocomposites as distinctive sensing materials, the utilization of bilayer sensor design, the design of robust sensing materials, and the high-throughput screening of sensing materials. In addition, the state-of-the-art and key issues in the implementation of electronic noses are discussed. Finally, a perspective on chemiresistive sensing materials for next-generation artificial olfaction is provided
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|a Journal Article
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|a Review
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|a artificial olfaction
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|a chemiresistors
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|a electronic noses
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|a gas sensors
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|a oxide semiconductors
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|a Oxides
|2 NLM
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|a Gases
|2 NLM
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1 |
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|a Kim, Jun-Sik
|e verfasserin
|4 aut
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1 |
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|a Lee, Jong-Heun
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 32(2020), 51 vom: 21. Dez., Seite e2002075
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:32
|g year:2020
|g number:51
|g day:21
|g month:12
|g pages:e2002075
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|u http://dx.doi.org/10.1002/adma.202002075
|3 Volltext
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|d 32
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|e 51
|b 21
|c 12
|h e2002075
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