Experimental setup for high-temperature in situ studies of crystallization of thin films with atmosphere control

open access.

Bibliographische Detailangaben
Veröffentlicht in:Journal of synchrotron radiation. - 1994. - 27(2020), Pt 5 vom: 01. Sept., Seite 1209-1217
1. Verfasser: Blichfeld, Anders Bank (VerfasserIn)
Weitere Verfasser: Bakken, Kristine, Chernyshov, Dmitry, Glaum, Julia, Grande, Tor, Einarsrud, Mari Ann
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2020
Zugriff auf das übergeordnete Werk:Journal of synchrotron radiation
Schlagworte:Journal Article chemical solution deposition high-temperature thin-film environments in situ studies synchrotron X-ray diffraction thin films
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245 1 0 |a Experimental setup for high-temperature in situ studies of crystallization of thin films with atmosphere control 
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520 |a Understanding the crystallization process for chemical solution deposition (CSD) processed thin films is key in designing the fabrication strategy for obtaining high-quality devices. Here, an in situ sample environment is presented for studying the crystallization of CSD processed thin films under typical processing parameters using near-grazing-incidence synchrotron X-ray diffraction. Typically, the pyrolysis is performed in a rapid thermal processing (RTP) unit, where high heating rates, high temperatures and atmosphere control are the main control parameters. The presented in situ setup can reach heating rates of 20°C s-1 and sample surface temperatures of 1000°C, comparable with commercial RTP units. Three examples for lead-free ferroelectric thin films are presented to show the potential of the new experimental set-up: high temperature, for crystallization of highly textured Sr0.4Ba0.6Nb2O6 on a SrTiO3 (001) substrate, high heating rate, revealing polycrystalline BaTiO3, and atmosphere control with 25% CO2, for crystallization of BaTiO3. The signal is sufficient to study a single deposited layer (≥10 nm for the crystallized film) which then defines the interface between the substrate and thin film for the following layers. A protocol for processing the data is developed to account for a thermal shift of the entire setup, including the sample, to allow extraction of maximum information from the refinement, e.g. texture. The simplicity of the sample environment allows for the future development of even more advanced measurements during thin-film processing under non-ambient conditions 
650 4 |a Journal Article 
650 4 |a chemical solution deposition 
650 4 |a high-temperature thin-film environments 
650 4 |a in situ studies 
650 4 |a synchrotron X-ray diffraction 
650 4 |a thin films 
700 1 |a Bakken, Kristine  |e verfasserin  |4 aut 
700 1 |a Chernyshov, Dmitry  |e verfasserin  |4 aut 
700 1 |a Glaum, Julia  |e verfasserin  |4 aut 
700 1 |a Grande, Tor  |e verfasserin  |4 aut 
700 1 |a Einarsrud, Mari Ann  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Journal of synchrotron radiation  |d 1994  |g 27(2020), Pt 5 vom: 01. Sept., Seite 1209-1217  |w (DE-627)NLM09824129X  |x 1600-5775  |7 nnns 
773 1 8 |g volume:27  |g year:2020  |g number:Pt 5  |g day:01  |g month:09  |g pages:1209-1217 
856 4 0 |u http://dx.doi.org/10.1107/S1600577520010140  |3 Volltext 
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