|
|
|
|
| LEADER |
01000caa a22002652c 4500 |
| 001 |
NLM311093094 |
| 003 |
DE-627 |
| 005 |
20250227102025.0 |
| 007 |
cr uuu---uuuuu |
| 008 |
231225s2020 xx |||||o 00| ||eng c |
| 024 |
7 |
|
|a 10.1002/adma.202000597
|2 doi
|
| 028 |
5 |
2 |
|a pubmed25n1036.xml
|
| 035 |
|
|
|a (DE-627)NLM311093094
|
| 035 |
|
|
|a (NLM)32530144
|
| 040 |
|
|
|a DE-627
|b ger
|c DE-627
|e rakwb
|
| 041 |
|
|
|a eng
|
| 100 |
1 |
|
|a Jeong, Beomjin
|e verfasserin
|4 aut
|
| 245 |
1 |
0 |
|a Micro- and Nanopatterning of Halide Perovskites Where Crystal Engineering for Emerging Photoelectronics Meets Integrated Device Array Technology
|
| 264 |
|
1 |
|c 2020
|
| 336 |
|
|
|a Text
|b txt
|2 rdacontent
|
| 337 |
|
|
|a ƒaComputermedien
|b c
|2 rdamedia
|
| 338 |
|
|
|a ƒa Online-Ressource
|b cr
|2 rdacarrier
|
| 500 |
|
|
|a Date Revised 16.11.2020
|
| 500 |
|
|
|a published: Print-Electronic
|
| 500 |
|
|
|a Citation Status PubMed-not-MEDLINE
|
| 520 |
|
|
|a © 2020 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
|
| 520 |
|
|
|a Tremendous efforts have been devoted to developing thin film halide perovskites (HPs) for use in high-performance photoelectronic devices, including solar cells, displays, and photodetectors. Furthermore, structured HPs with periodic micro- or nanopatterns have recently attracted significant interest due to their potential to not only improve the efficiency of an individual device via the controlled arrangement of HP crystals into a confined geometry, but also to technologically pixelate the device into arrays suitable for future commercialization. However, micro- or nanopatterning of HPs is not usually compatible with conventional photolithography, which is detrimental to ionic HPs and requires special techniques. Herein, a comprehensive overview of the state-of-the-art technologies used to develop micro- and nanometer-scale HP patterns, with an emphasis on their controlled microstructures based on top-down and bottom-up approaches, and their potential for future applications, is provided. Top-down approaches include modified conventional lithographic techniques and soft-lithographic methods, while bottom-up approaches include template-assisted patterning of HPs based on lithographically defined prepatterns and self-assembly. HP patterning is shown here to not only improve device performance, but also to reveal the unprecedented functionality of HPs, leading to new research areas that utilize their novel photophysical properties
|
| 650 |
|
4 |
|a Journal Article
|
| 650 |
|
4 |
|a Review
|
| 650 |
|
4 |
|a crystal engineering
|
| 650 |
|
4 |
|a lead halide perovskites
|
| 650 |
|
4 |
|a lithography
|
| 650 |
|
4 |
|a micropatterning
|
| 650 |
|
4 |
|a nanopatterning
|
| 650 |
|
4 |
|a photoelectronic devices
|
| 650 |
|
4 |
|a self-assembled materials
|
| 650 |
|
4 |
|a template-assisted growth
|
| 700 |
1 |
|
|a Han, Hyowon
|e verfasserin
|4 aut
|
| 700 |
1 |
|
|a Park, Cheolmin
|e verfasserin
|4 aut
|
| 773 |
0 |
8 |
|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 32(2020), 30 vom: 10. Juli, Seite e2000597
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnas
|
| 773 |
1 |
8 |
|g volume:32
|g year:2020
|g number:30
|g day:10
|g month:07
|g pages:e2000597
|
| 856 |
4 |
0 |
|u http://dx.doi.org/10.1002/adma.202000597
|3 Volltext
|
| 912 |
|
|
|a GBV_USEFLAG_A
|
| 912 |
|
|
|a SYSFLAG_A
|
| 912 |
|
|
|a GBV_NLM
|
| 912 |
|
|
|a GBV_ILN_350
|
| 951 |
|
|
|a AR
|
| 952 |
|
|
|d 32
|j 2020
|e 30
|b 10
|c 07
|h e2000597
|