Nanoasperity Adhesion of the Silicon Surface in Humid Air : The Roles of Surface Chemistry and Oxidized Layer Structures
The interfacial adhesion between silicon oxide surfaces is normally believed to be governed by the surface chemistry of the topmost surface affecting the water contact angle and hydrogen bonding interactions. In the case of a silicon wafer, the physical structure of the native oxide at the surface c...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 36(2020), 20 vom: 26. Mai, Seite 5483-5491
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| 1. Verfasser: |
Xiao, Chen
(VerfasserIn) |
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| Weitere Verfasser: |
Chen, Chao,
Yao, Yangyang,
Liu, Hongshen,
Chen, Lei,
Qian, Linmao,
Kim, Seong H |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2020
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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