Modified Organosilane Monolayers With Enhanced Radiation Stability
Organosilane monolayers containing long carbon chains are susceptible to damage when exposed to X-rays and other radiation during characterization or processing. The origin of the damage has been attributed to both energetic photons and photoelectrons. These particles can break bonds in the molecule...
Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 36(2020), 15 vom: 21. Apr., Seite 4116-4122 |
---|---|
1. Verfasser: | |
Weitere Verfasser: | |
Format: | Online-Aufsatz |
Sprache: | English |
Veröffentlicht: |
2020
|
Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
Schlagworte: | Journal Article |
Online verfügbar |
Volltext |