Modified Organosilane Monolayers With Enhanced Radiation Stability
Organosilane monolayers containing long carbon chains are susceptible to damage when exposed to X-rays and other radiation during characterization or processing. The origin of the damage has been attributed to both energetic photons and photoelectrons. These particles can break bonds in the molecule...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 36(2020), 15 vom: 21. Apr., Seite 4116-4122 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
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2020
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Online verfügbar |
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