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231225s2019 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.9b02770
|2 doi
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|a pubmed24n1013.xml
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|a (DE-627)NLM30392599X
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|a (NLM)31790593
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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| 100 |
1 |
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|a He, Qiming
|e verfasserin
|4 aut
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| 245 |
1 |
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|a Enrichment and Distribution of Pb2+ Ions in Zwitterionic Poly(cysteine methacrylate) Brushes at the Solid-Liquid Interface
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|c 2019
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 04.03.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a Cysteine-based polyzwitterionic brushes have been prepared via a two-step route. First, poly(allyl methacrylate) (PAMA) brushes have been grown from the surface of silicon substrates using surface-initiated atom transfer radical polymerization. The obtained PAMA brushes with free pendant vinyl groups were further modified via radical thiol-ene addition reaction to attach l-cysteine moieties. Surface ζ potential investigations on pH-responsiveness of these poly(cysteine methacrylate) (PCysMA) brushes confirm their zwitterionic character at intermediate pH range, while at pH values either below pH 3.50 or above pH 8.59, they exhibit polyelectrolyte character. Under acid (pH < 3.50) or base (pH > 8.59) conditions, they possess either cationic or anionic character, respectively. In the zwitterionic region, these PCysMA brushes show positive surface ζ potential in the presence of Pb(CH3COO)2 solutions of various concentrations. The results are in line with microscopic investigations using anomalous X-ray reflectivity (AXRR) carried out along the absorption edge of Pb2+ ions. When the photon energies were varied around the absorption L3 edge of lead (13037 eV), the Pb2+ concentration normal to the silicon substrates, as a function of depth inside PCysMA brushes, could be revealed at the nanoscale. Both ζ potential and AXRR measurements confirm the enrichment of Pb2+ ions inside PCysMA brushes, indicating the potential of PCysMA to be used as a water purification material
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|a Journal Article
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1 |
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|a Qiao, Yijun
|e verfasserin
|4 aut
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1 |
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|a Mandia, David J
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Gan, Shenglong
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhang, Huiru
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhou, Hua
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Elam, Jeffrey W
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Darling, Seth B
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Tirrell, Matthew V
|e verfasserin
|4 aut
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| 700 |
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|a Chen, Wei
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 35(2019), 52 vom: 31. Dez., Seite 17082-17089
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
1 |
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|g volume:35
|g year:2019
|g number:52
|g day:31
|g month:12
|g pages:17082-17089
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|u http://dx.doi.org/10.1021/acs.langmuir.9b02770
|3 Volltext
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