Suppressed Surface Reorganization in a High-Density Poly(methyl methacrylate) Brush
A high-density poly(methyl methacrylate) (PMMA) brush (σ = 0.77 chain/nm2) with a lower molecular weight distribution was prepared onto a silicon wafer by surface-initiated atom transfer radical polymerization. The surface of the PMMA brush chains was characterized upon the process of the environmen...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 35(2019), 46 vom: 19. Nov., Seite 14890-14895
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| 1. Verfasser: |
Zuo, Biao
(VerfasserIn) |
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| Weitere Verfasser: |
Xu, Quanyin,
Jin, Tiancheng,
Xing, Huimin,
Shi, Jiacheng,
Hao, Zhiwei,
Zhang, Li,
Tanaka, Keiji,
Wang, Xinping |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2019
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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