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231225s2019 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.9b01000
|2 doi
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|a pubmed24n0996.xml
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|a (DE-627)NLM298960907
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|a (NLM)31282679
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Kalosi, Anna
|e verfasserin
|4 aut
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|a Tailored Langmuir-Schaefer Deposition of Few-Layer MoS2 Nanosheet Films for Electronic Applications
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|c 2019
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 23.09.2019
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a Few-layer MoS2 films stay at the forefront of current research of two-dimensional materials. At present, continuous MoS2 films are prepared by chemical vapor deposition (CVD) techniques. Herein, we present a cost-effective fabrication of the large-area spatially uniform films of few-layer MoS2 flakes using a modified Langmuir-Schaefer technique. The compression of the liquid-phase exfoliated MoS2 flakes on the water subphase was used to form a continuous layer, which was subsequently transferred onto a submerged substrate by removing the subphase. After vacuum annealing, the electrical sheet resistance dropped to a level of 10 kΩ/sq, being highly competitive with that of CVD-deposited MoS2 nanosheet films. In addition, a consistent fabrication protocol of the large-area conductive MoS2 films was established. The morphology and electrical properties predetermine these films to advanced detecting, sensing, and catalytic applications. A large number of experimental techniques were used to characterize the exfoliated few-layer MoS2 flakes and to elucidate the formation of the few-layer MoS2 Langmuir film
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|a Journal Article
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|a Demydenko, Maksym
|e verfasserin
|4 aut
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|a Bodik, Michal
|e verfasserin
|4 aut
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|a Hagara, Jakub
|e verfasserin
|4 aut
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|a Kotlar, Mario
|e verfasserin
|4 aut
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|a Kostiuk, Dmytro
|e verfasserin
|4 aut
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|a Halahovets, Yuriy
|e verfasserin
|4 aut
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|a Vegso, Karol
|e verfasserin
|4 aut
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|a Marin Roldan, Alicia
|e verfasserin
|4 aut
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|a Maurya, Gulab Singh
|e verfasserin
|4 aut
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|a Angus, Michal
|e verfasserin
|4 aut
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|a Veis, Pavel
|e verfasserin
|4 aut
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|a Jergel, Matej
|e verfasserin
|4 aut
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|a Majkova, Eva
|e verfasserin
|4 aut
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|a Siffalovic, Peter
|e verfasserin
|4 aut
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 35(2019), 30 vom: 30. Juli, Seite 9802-9808
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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|g volume:35
|g year:2019
|g number:30
|g day:30
|g month:07
|g pages:9802-9808
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|u http://dx.doi.org/10.1021/acs.langmuir.9b01000
|3 Volltext
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|a AR
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|d 35
|j 2019
|e 30
|b 30
|c 07
|h 9802-9808
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