A Robust Nonvolatile Resistive Memory Device Based on a Freestanding Ultrathin 2D Imine Polymer Film
© 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
| Veröffentlicht in: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 31(2019), 28 vom: 16. Juli, Seite e1902264 |
|---|---|
| 1. Verfasser: | |
| Weitere Verfasser: | , , , , , |
| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2019
|
| Zugriff auf das übergeordnete Werk: | Advanced materials (Deerfield Beach, Fla.) |
| Schlagworte: | Journal Article 2D imine polymers covalent organic frameworks flexible devices memristors nonvolatile memory |
| Zusammenfassung: | © 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. Here, the synthesis of a wafer-scale ultrathin 2D imine polymer (2DP) film with controllable thickness from simple benzene-1,3,5-tricarbaldehyde (BTA) and p-phenylenediamine (PDA) building blocks is reported using a Schiff base polycondensation reaction at the air-water interface. The synthesized freestanding 2DP films are porous, insulating, and more importantly, covalently linked, which is ideally suited for nonvolatile memristors that use a conductive filament mechanism. These devices exhibit excellent switching performance with high reliability and reproducibility, with on/off ratios in the range of 102 to 105 depending on the thickness of the film. In addition, the endurance and data retention capability of 2DP-based nonvolatile resistive memristors are up to 200 cycles and 8 × 104 s under constant voltage stress at 0.1 V. The intrinsic flexibility of the covalent organic polymer enables the fabrication of a flexible memory device on a polyimide film, which exhibits as reliable memory performance as that on the rigid substrate. Moreover, the 2DP-based memory device shows outstanding thermal stability and organic solvent resistance, which are desirable properties for applications in wearable devices |
|---|---|
| Beschreibung: | Date Revised 01.10.2020 published: Print-Electronic Citation Status PubMed-not-MEDLINE |
| ISSN: | 1521-4095 |
| DOI: | 10.1002/adma.201902264 |