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231225s2018 xx |||||o 00| ||eng c |
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|a 10.1021/acs.chemmater.7b02938
|2 doi
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|a pubmed24n0963.xml
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|a (NLM)30270988
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|a DE-627
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|a eng
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|a Hannula, Markku
|e verfasserin
|4 aut
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|a Improved Stability of Atomic Layer Deposited Amorphous TiO2 Photoelectrode Coatings by Thermally Induced Oxygen Defects
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|c 2018
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Revised 20.11.2019
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a Amorphous titanium dioxide (a-TiO2) combined with an electrocatalyst has shown to be a promising coating for stabilizing traditional semiconductor materials used in artificial photosynthesis for efficient photoelectrochemical solar-to-fuel energy conversion. In this study we report a detailed analysis of two methods of modifying an undoped thin film of atomic layer deposited (ALD) a-TiO2 without an electrocatalyst to affect its performance in water splitting reaction as a protective photoelectrode coating. The methods are high-temperature annealing in ultrahigh vacuum and atomic hydrogen exposure. A key feature in both methods is that they preserve the amorphous structure of the film. Special attention is paid to the changes in the molecular and electronic structure of a-TiO2 induced by these treatments. On the basis of the photoelectrochemical results, the a-TiO2 is susceptible to photocorrosion but significant improvement in stability is achieved after heat treatment in vacuum at temperatures above 500 °C. On the other hand, the hydrogen treatment does not increase the stability despite the ostensibly similar reduction of a-TiO2. The surface analysis allows us to interpret the improved stability to the thermally induced formation of O- species within a-TiO2 that are essentially electronic defects in the anionic framework
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|a Journal Article
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|a Ali-Löytty, Harri
|e verfasserin
|4 aut
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|a Lahtonen, Kimmo
|e verfasserin
|4 aut
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|a Sarlin, Essi
|e verfasserin
|4 aut
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|a Saari, Jesse
|e verfasserin
|4 aut
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|a Valden, Mika
|e verfasserin
|4 aut
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|i Enthalten in
|t Chemistry of materials : a publication of the American Chemical Society
|d 1998
|g 30(2018), 4 vom: 27. Feb., Seite 1199-1208
|w (DE-627)NLM098194763
|x 0897-4756
|7 nnns
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|g volume:30
|g year:2018
|g number:4
|g day:27
|g month:02
|g pages:1199-1208
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|u http://dx.doi.org/10.1021/acs.chemmater.7b02938
|3 Volltext
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