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231225s2018 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.8b02114
|2 doi
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|a pubmed24n0960.xml
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|a (DE-627)NLM288171403
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|a (NLM)30179498
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Oyelade, Adeola
|e verfasserin
|4 aut
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|a Composition-Dependent Charge Transport in Boron Carbides Alloyed with Aromatics
|b Plasma Enhanced Chemical Vapor Deposition Aniline/Orthocarborane Films
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|c 2018
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Completed 17.12.2018
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|a Date Revised 17.12.2018
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a Boron carbide films, alloyed with aniline moieties, were deposited by plasma enhanced chemical vapor deposition (PECVD) from aniline and orthocarborane precursors and were found to exhibit composition-dependent drift carrier lifetimes as derived from I( V) and C( V)) measurements. For a film with an aniline/carborane ratio of 5:1, the effective drift carrier lifetimes are ∼80 μs at low bias voltage but quickly drop to a few microseconds with increasing bias. A film with a 10:1 aniline/carborane ratio, however, exhibited lifetimes of ∼6 μs, or less, at 1 kHz, and much smaller values at 10 kHz. These lifetimes are orders of magnitude longer than those in polyaniline films and comparable to those in PECVD carborane films without aromatic content. X-ray photoelectron spectroscopy (XPS), FTIR, and ellipsometry, combined with density functional theory (DFT)-based cluster calculations, indicate that aniline and orthocarborane moieties are largely intact within the films. Bonding occurs primarily between aniline C sites and carborane B sites, and the aniline coordination number per carborane icosahedron is ∼2 as the aniline/carborane ratio is increased from 3:1 to 10:1. This aniline/carborane coordination ratio independent of aniline/orthocarborane stoichiometry is consistent with the dependence of charge transport properties on aniline film content at high bias voltage
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|a Journal Article
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|a Research Support, U.S. Gov't, Non-P.H.S.
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|a Yost, Andrew J
|e verfasserin
|4 aut
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|a Benker, Nicole
|e verfasserin
|4 aut
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|a Dong, Bin
|e verfasserin
|4 aut
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|a Knight, Sean
|e verfasserin
|4 aut
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|a Schubert, Mathias
|e verfasserin
|4 aut
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|a Dowben, Peter A
|e verfasserin
|4 aut
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|a Kelber, Jeffry A
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 34(2018), 40 vom: 09. Okt., Seite 12007-12016
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
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|g volume:34
|g year:2018
|g number:40
|g day:09
|g month:10
|g pages:12007-12016
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|u http://dx.doi.org/10.1021/acs.langmuir.8b02114
|3 Volltext
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