Scalable Manufacturing of Nanogaps

© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 30(2018), 46 vom: 29. Nov., Seite e1801124
1. Verfasser: Dubois, Valentin (VerfasserIn)
Weitere Verfasser: Bleiker, Simon J, Stemme, Göran, Niklaus, Frank
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2018
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Review break junctions crack junctions nanogap electrodes parallel fabrication wafer scale
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520 |a The ability to manufacture a nanogap in between two electrodes has proven a powerful catalyst for scientific discoveries in nanoscience and molecular electronics. A wide range of bottom-up and top-down methodologies are now available to fabricate nanogaps that are less than 10 nm wide. However, most available techniques involve time-consuming serial processes that are not compatible with large-scale manufacturing of nanogap devices. The scalable manufacturing of sub-10 nm gaps remains a great technological challenge that currently hinders both experimental nanoscience and the prospects for commercial exploitation of nanogap devices. Here, available nanogap fabrication methodologies are reviewed and a detailed comparison of their merits is provided, with special focus on large-scale and reproducible manufacturing of nanogaps. The most promising approaches that could achieve a breakthrough in research and commercial applications are identified. Emerging scalable nanogap manufacturing methodologies will ultimately enable applications with high scientific and societal impact, including high-speed whole genome sequencing, electromechanical computing, and molecular electronics using nanogap electrodes 
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650 4 |a parallel fabrication 
650 4 |a wafer scale 
700 1 |a Bleiker, Simon J  |e verfasserin  |4 aut 
700 1 |a Stemme, Göran  |e verfasserin  |4 aut 
700 1 |a Niklaus, Frank  |e verfasserin  |4 aut 
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