Ito, S., Kasuya, M., Kawasaki, K., Washiya, R., Shimazaki, Y., Miyauchi, A., . . . Nakagawa, M. (2018). Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement. Langmuir : the ACS journal of surfaces and colloids, 34(32), 9366. https://doi.org/10.1021/acs.langmuir.8b01881
Style de citation ChicagoIto, Shunya, Motohiro Kasuya, Kenji Kawasaki, Ryuta Washiya, Yuzuru Shimazaki, Akihiro Miyauchi, Kazue Kurihara, et Masaru Nakagawa. "Selection of Diacrylate Monomers for Sub-15 Nm Ultraviolet Nanoimprinting by Resonance Shear Measurement." Langmuir : The ACS Journal of Surfaces and Colloids 34, no. 32 (2018): 9366. https://dx.doi.org/10.1021/acs.langmuir.8b01881.
Style de citation MLAIto, Shunya, et al. "Selection of Diacrylate Monomers for Sub-15 Nm Ultraviolet Nanoimprinting by Resonance Shear Measurement." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 34, no. 32, 2018, p. 9366.