Style de citation APA

Dolinski, N. D., Page, Z. A., Callaway, E. B., Eisenreich, F., Garcia, R. V., Chavez, R., . . . Hawker, C. J. (2018). Solution Mask Liquid Lithography (SMaLL) for One-Step, Multimaterial 3D Printing. Advanced materials (Deerfield Beach, Fla.), 30(31), . https://doi.org/10.1002/adma.201800364

Style de citation Chicago

Dolinski, Neil D., et al. "Solution Mask Liquid Lithography (SMaLL) for One-Step, Multimaterial 3D Printing." Advanced Materials (Deerfield Beach, Fla.) 30, no. 31 (2018). https://dx.doi.org/10.1002/adma.201800364.

Style de citation MLA

Dolinski, Neil D., et al. "Solution Mask Liquid Lithography (SMaLL) for One-Step, Multimaterial 3D Printing." Advanced Materials (Deerfield Beach, Fla.), vol. 30, no. 31, 2018.