Solution Processed Metal Oxide High-κ Dielectrics for Emerging Transistors and Circuits

© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - (2018) vom: 14. Juni, Seite e1706364
1. Verfasser: Liu, Ao (VerfasserIn)
Weitere Verfasser: Zhu, Huihui, Sun, Huabin, Xu, Yong, Noh, Yong-Young
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2018
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Review field-effect transistors high-κ dielectrics metal oxide insulator solution processing thin-film transistors
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520 |a The electronic functionalities of metal oxides comprise conductors, semiconductors, and insulators. Metal oxides have attracted great interest for construction of large-area electronics, particularly thin-film transistors (TFTs), for their high optical transparency, excellent chemical and thermal stability, and mechanical tolerance. High-permittivity (κ) oxide dielectrics are a key component for achieving low-voltage and high-performance TFTs. With the expanding integration of complementary metal oxide semiconductor transistors, the replacement of SiO2 with high-κ oxide dielectrics has become urgently required, because their provided thicker layers suppress quantum mechanical tunneling. Toward low-cost devices, tremendous efforts have been devoted to vacuum-free, solution processable fabrication, such as spin coating, spray pyrolysis, and printing techniques. This review focuses on recent progress in solution processed high-κ oxide dielectrics and their applications to emerging TFTs. First, the history, basics, theories, and leakage current mechanisms of high-κ oxide dielectrics are presented, and the underlying mechanism for mobility enhancement over conventional SiO2 is outlined. Recent achievements of solution-processed high-κ oxide materials and their applications in TFTs are summarized and traditional coating methods and emerging printing techniques are introduced. Finally, low temperature approaches, e.g., ecofriendly water-induced, self-combustion reaction, and energy-assisted post treatments, for the realization of flexible electronics and circuits are discussed 
650 4 |a Journal Article 
650 4 |a Review 
650 4 |a field-effect transistors 
650 4 |a high-κ dielectrics 
650 4 |a metal oxide insulator 
650 4 |a solution processing 
650 4 |a thin-film transistors 
700 1 |a Zhu, Huihui  |e verfasserin  |4 aut 
700 1 |a Sun, Huabin  |e verfasserin  |4 aut 
700 1 |a Xu, Yong  |e verfasserin  |4 aut 
700 1 |a Noh, Yong-Young  |e verfasserin  |4 aut 
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