High-Brightness Blue Light-Emitting Diodes Enabled by a Directly Grown Graphene Buffer Layer

© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Détails bibliographiques
Publié dans:Advanced materials (Deerfield Beach, Fla.). - 1998. - 30(2018), 30 vom: 08. Juli, Seite e1801608
Auteur principal: Chen, Zhaolong (Auteur)
Autres auteurs: Zhang, Xiang, Dou, Zhipeng, Wei, Tongbo, Liu, Zhiqiang, Qi, Yue, Ci, Haina, Wang, Yunyu, Li, Yang, Chang, Hongliang, Yan, Jianchang, Yang, Shenyuan, Zhang, Yanfeng, Wang, Junxi, Gao, Peng, Li, Jinmin, Liu, Zhongfan
Format: Article en ligne
Langue:English
Publié: 2018
Accès à la collection:Advanced materials (Deerfield Beach, Fla.)
Sujets:Journal Article chemical vapor deposition gallium nitride graphene light-emitting diodes
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520 |a Single-crystalline GaN-based light-emitting diodes (LEDs) with high efficiency and long lifetime are the most promising solid-state lighting source compared with conventional incandescent and fluorescent lamps. However, the lattice and thermal mismatch between GaN and sapphire substrate always induces high stress and high density of dislocations and thus degrades the performance of LEDs. Here, the growth of high-quality GaN with low stress and a low density of dislocations on graphene (Gr) buffered sapphire substrate is reported for high-brightness blue LEDs. Gr films are directly grown on sapphire substrate to avoid the tedious transfer process and GaN is grown by metal-organic chemical vapor deposition (MOCVD). The introduced Gr buffer layer greatly releases biaxial stress and reduces the density of dislocations in GaN film and Inx Ga1-x N/GaN multiple quantum well structures. The as-fabricated LED devices therefore deliver much higher light output power compared to that on a bare sapphire substrate, which even outperforms the mature process derived counterpart. The GaN growth on Gr buffered sapphire only requires one-step growth, which largely shortens the MOCVD growth time. This facile strategy may pave a new way for applications of Gr films and bring several disruptive technologies for epitaxial growth of GaN film and its applications in high-brightness LEDs 
650 4 |a Journal Article 
650 4 |a chemical vapor deposition 
650 4 |a gallium nitride 
650 4 |a graphene 
650 4 |a light-emitting diodes 
700 1 |a Zhang, Xiang  |e verfasserin  |4 aut 
700 1 |a Dou, Zhipeng  |e verfasserin  |4 aut 
700 1 |a Wei, Tongbo  |e verfasserin  |4 aut 
700 1 |a Liu, Zhiqiang  |e verfasserin  |4 aut 
700 1 |a Qi, Yue  |e verfasserin  |4 aut 
700 1 |a Ci, Haina  |e verfasserin  |4 aut 
700 1 |a Wang, Yunyu  |e verfasserin  |4 aut 
700 1 |a Li, Yang  |e verfasserin  |4 aut 
700 1 |a Chang, Hongliang  |e verfasserin  |4 aut 
700 1 |a Yan, Jianchang  |e verfasserin  |4 aut 
700 1 |a Yang, Shenyuan  |e verfasserin  |4 aut 
700 1 |a Zhang, Yanfeng  |e verfasserin  |4 aut 
700 1 |a Wang, Junxi  |e verfasserin  |4 aut 
700 1 |a Gao, Peng  |e verfasserin  |4 aut 
700 1 |a Li, Jinmin  |e verfasserin  |4 aut 
700 1 |a Liu, Zhongfan  |e verfasserin  |4 aut 
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