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231225s2018 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201706569
|2 doi
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|a pubmed24n0937.xml
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|a (NLM)29473234
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|a DE-627
|b ger
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|e rakwb
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|a eng
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|a Lee, Eunho
|e verfasserin
|4 aut
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|a Direct Growth of Highly Stable Patterned Graphene on Dielectric Insulators using a Surface-Adhered Solid Carbon Source
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|c 2018
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Completed 01.08.2018
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|a Date Revised 30.09.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a A novel method is described for the direct growth of patterned graphene on dielectric substrates by chemical vapor deposition (CVD) in the presence of Cu vapor and using a solid aromatic carbon source, 1,2,3,4-tetraphenylnapthalene (TPN), as the precursor. The UV/O3 treatment of the TPN film both crosslinks TPN and results in a strong interaction between the substrate and the TPN that prevents complete sublimation of the carbon source from the substrate during CVD. Substrate-adhered crosslinked TPN is successfully converted to graphene on the substrate without any organic contamination. The graphene synthesized by this method shows excellent mechanical and chemical stability. This process also enables the simultaneous patterning of graphene materials, which can thus be used as transparent electrodes for electronic devices. The proposed method for the synthesis directly on substrates of patterned graphene is expected to have wide applications in organic and soft hybrid electronics
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|a Journal Article
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|a chemical vapor deposition
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|a direct growth
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|a patterned graphene
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|a polycyclic aromatic hydrocarbon
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|a solid carbon source
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|a Lee, Seung Goo
|e verfasserin
|4 aut
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|a Lee, Hyo Chan
|e verfasserin
|4 aut
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|a Jo, Mankyu
|e verfasserin
|4 aut
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|a Yoo, Min Seok
|e verfasserin
|4 aut
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|a Cho, Kilwon
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 30(2018), 15 vom: 01. Apr., Seite e1706569
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:30
|g year:2018
|g number:15
|g day:01
|g month:04
|g pages:e1706569
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|u http://dx.doi.org/10.1002/adma.201706569
|3 Volltext
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