Vacuum Ultraviolet Treatment of Acid- and Ester-Terminated Self-Assembled Monolayers : Chemical Conversions and Friction Reduction

We have prepared COOH- and COOCH3-terminated self-assembled monolayers (SAMs) from undec-10-enoic acid (UDA) and methyl undec-10-enoate (MUDO) molecules on hydrogen-terminated silicon (H-Si) substrates through ultraviolet (UV) irradiation. The as-prepared UDA- and MUDO-SAMs were exposed to 172 nm va...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 34(2018), 10 vom: 13. März, Seite 3228-3236
1. Verfasser: Soliman, Ahmed I A (VerfasserIn)
Weitere Verfasser: Utsunomiya, Toru, Ichii, Takashi, Sugimura, Hiroyuki
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2018
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't