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231225s2018 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201706846
|2 doi
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|a pubmed24n0936.xml
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|a (DE-627)NLM280832273
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|a (NLM)29424026
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Kang, Jiheong
|e verfasserin
|4 aut
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|a Tough and Water-Insensitive Self-Healing Elastomer for Robust Electronic Skin
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|c 2018
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Completed 07.03.2019
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|a Date Revised 30.09.2020
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a An electronic (e-) skin is expected to experience significant wear and tear over time. Therefore, self-healing stretchable materials that are simultaneously soft and with high fracture energy, that is high tolerance of damage or small cracks without propagating, are essential requirements for the realization of robust e-skin. However, previously reported elastomers and especially self-healing polymers are mostly viscoelastic and lack high mechanical toughness. Here, a new class of polymeric material crosslinked through rationally designed multistrength hydrogen bonding interactions is reported. The resultant supramolecular network in polymer film realizes exceptional mechanical properties such as notch-insensitive high stretchability (1200%), high toughness of 12 000 J m-2 , and autonomous self-healing even in artificial sweat. The tough self-healing materials enable the wafer-scale fabrication of robust and stretchable self-healing e-skin devices, which will provide new directions for future soft robotics and skin prosthetics
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|a Journal Article
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|a electronic skin
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|a self-healable electronics
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|a self-healing elastomer
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|a toughness
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|a Elastomers
|2 NLM
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|a Polymers
|2 NLM
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|a Water
|2 NLM
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|a 059QF0KO0R
|2 NLM
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1 |
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|a Son, Donghee
|e verfasserin
|4 aut
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1 |
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|a Wang, Ging-Ji Nathan
|e verfasserin
|4 aut
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1 |
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|a Liu, Yuxin
|e verfasserin
|4 aut
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|a Lopez, Jeffrey
|e verfasserin
|4 aut
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1 |
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|a Kim, Yeongin
|e verfasserin
|4 aut
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1 |
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|a Oh, Jin Young
|e verfasserin
|4 aut
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|a Katsumata, Toru
|e verfasserin
|4 aut
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1 |
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|a Mun, Jaewan
|e verfasserin
|4 aut
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1 |
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|a Lee, Yeongjun
|e verfasserin
|4 aut
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1 |
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|a Jin, Lihua
|e verfasserin
|4 aut
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1 |
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|a Tok, Jeffrey B-H
|e verfasserin
|4 aut
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|a Bao, Zhenan
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 30(2018), 13 vom: 09. März, Seite e1706846
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:30
|g year:2018
|g number:13
|g day:09
|g month:03
|g pages:e1706846
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|u http://dx.doi.org/10.1002/adma.201706846
|3 Volltext
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