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231225s2018 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201705880
|2 doi
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|a pubmed24n0932.xml
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|a (DE-627)NLM279787987
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|a (NLM)29315924
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|a DE-627
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|e rakwb
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|a eng
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|a Wu, Jing-Yuan
|e verfasserin
|4 aut
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|a Broadband MoS2 Field-Effect Phototransistors
|b Ultrasensitive Visible-Light Photoresponse and Negative Infrared Photoresponse
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|c 2018
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Completed 01.08.2018
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|a Date Revised 30.09.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a Inverse photoresponse is discovered from phototransistors based on molybdenum disulfide (MoS2 ). The devices are capable of detecting photons with energy below the bandgap of MoS2 . Under the illumination of near-infrared (NIR) light at 980 and 1550 nm, negative photoresponses with short response time (50 ms) are observed for the first time. Upon visible-light illumination, the phototransistors exhibit positive photoresponse with ultrahigh responsivity on the order of 104 -105 A W-1 owing to the photogating effect and charge trapping mechanism. Besides, the phototransistors can detect a weak visible-light signal with effective optical power as low as 17 picowatts (pW). A thermally induced photoresponse mechanism, the bolometric effect, is proposed as the cause of the negative photocurrent in the NIR regime. The thermal energy of the NIR radiation is transferred to the MoS2 crystal lattice, inducing lattice heating and resistance increase. This model is experimentally confirmed by low-temperature electrical measurements. The bolometric coefficient calculated from the measured transport current change with temperature is -33 nA K-1 . These findings offer a new approach to develop sub-bandgap photodetectors and other novel optoelectronic devices based on 2D layered materials
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|a Journal Article
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|a bolometric effect
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|a inverse photoresponse
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|a molybdenum disulfide
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|a sub-bandgap photodetector
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|a ultrahigh photoresponsivity
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|a Chun, Young Tea
|e verfasserin
|4 aut
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1 |
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|a Li, Shunpu
|e verfasserin
|4 aut
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|a Zhang, Tong
|e verfasserin
|4 aut
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1 |
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|a Wang, Junzhan
|e verfasserin
|4 aut
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1 |
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|a Shrestha, Pawan Kumar
|e verfasserin
|4 aut
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| 700 |
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|a Chu, Daping
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 30(2018), 7 vom: 20. Feb.
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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| 773 |
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|g volume:30
|g year:2018
|g number:7
|g day:20
|g month:02
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|u http://dx.doi.org/10.1002/adma.201705880
|3 Volltext
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