Formation of Concentric Silica Nanogrooves Guided by the Curved Surface of Silica Particles

The flexible control of nanopatterns by a bottom-up process at the nanometer scale is essential for nanofabrication with a finer pitch. We have previously reported that for the fabrication of linear nanopatterns with sub-5 nm periodicity on Si substrates the outermost surfaces of assembled micelles...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 34(2018), 4 vom: 30. Jan., Seite 1733-1741
1. Verfasser: Hara, Shintaro (VerfasserIn)
Weitere Verfasser: Hirota, Keiya, Tabe, Yuka, Wada, Hiroaki, Shimojima, Atsushi, Kuroda, Kazuyuki
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2018
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't