Formation of Concentric Silica Nanogrooves Guided by the Curved Surface of Silica Particles
The flexible control of nanopatterns by a bottom-up process at the nanometer scale is essential for nanofabrication with a finer pitch. We have previously reported that for the fabrication of linear nanopatterns with sub-5 nm periodicity on Si substrates the outermost surfaces of assembled micelles...
Ausführliche Beschreibung
Bibliographische Detailangaben
Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 34(2018), 4 vom: 30. Jan., Seite 1733-1741
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1. Verfasser: |
Hara, Shintaro
(VerfasserIn) |
Weitere Verfasser: |
Hirota, Keiya,
Tabe, Yuka,
Wada, Hiroaki,
Shimojima, Atsushi,
Kuroda, Kazuyuki |
Format: | Online-Aufsatz
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Sprache: | English |
Veröffentlicht: |
2018
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Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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Schlagworte: | Journal Article
Research Support, Non-U.S. Gov't |