Efficient high-order suppression system for a metrology beamline

High-quality metrology with synchrotron radiation requires in particular a very high spectral purity of the incident beam. This is usually achieved by a set of transmission filters with suitable absorption edges to suppress high-order radiation of the monochromator. The at-wavelength metrology stati...

Ausführliche Beschreibung

Bibliographische Detailangaben
Veröffentlicht in:Journal of synchrotron radiation. - 1994. - 25(2018), Pt 1 vom: 01. Jan., Seite 100-107
1. Verfasser: Sokolov, A (VerfasserIn)
Weitere Verfasser: Sertsu, M G, Gaupp, A, Lüttecke, M, Schäfers, F
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2018
Zugriff auf das übergeordnete Werk:Journal of synchrotron radiation
Schlagworte:Journal Article PGM beamline XUV optical elements at-wavelength metrology diffraction gratings higher orders reflectometer
LEADER 01000caa a22002652c 4500
001 NLM279354304
003 DE-627
005 20250222200846.0
007 cr uuu---uuuuu
008 231225s2018 xx |||||o 00| ||eng c
024 7 |a 10.1107/S1600577517016800  |2 doi 
028 5 2 |a pubmed25n0931.xml 
035 |a (DE-627)NLM279354304 
035 |a (NLM)29271758 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Sokolov, A  |e verfasserin  |4 aut 
245 1 0 |a Efficient high-order suppression system for a metrology beamline 
264 1 |c 2018 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Revised 12.11.2023 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a High-quality metrology with synchrotron radiation requires in particular a very high spectral purity of the incident beam. This is usually achieved by a set of transmission filters with suitable absorption edges to suppress high-order radiation of the monochromator. The at-wavelength metrology station at a BESSY-II bending-magnet collimated plane-grating monochromator (c-PGM) beamline has recently commissioned a high-order suppression system (HiOS) based on four reflections from mirrors which can be inserted into the beam path. Two pairs of mirrors are aligned parallel so as not to disturb the original beam path and are rotated clockwise and counter-clockwise. Three sets of coatings are available for the different energy ranges and the incidence angle is freely tunable to find the optimum figure of merit for maximum suppression at maximum transmission for each photon energy required. Measured performance results of the HiOS for the EUV and XUV range are compared with simulations, and applications are discussed 
650 4 |a Journal Article 
650 4 |a PGM beamline 
650 4 |a XUV optical elements 
650 4 |a at-wavelength metrology 
650 4 |a diffraction gratings 
650 4 |a higher orders 
650 4 |a reflectometer 
700 1 |a Sertsu, M G  |e verfasserin  |4 aut 
700 1 |a Gaupp, A  |e verfasserin  |4 aut 
700 1 |a Lüttecke, M  |e verfasserin  |4 aut 
700 1 |a Schäfers, F  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Journal of synchrotron radiation  |d 1994  |g 25(2018), Pt 1 vom: 01. Jan., Seite 100-107  |w (DE-627)NLM09824129X  |x 1600-5775  |7 nnas 
773 1 8 |g volume:25  |g year:2018  |g number:Pt 1  |g day:01  |g month:01  |g pages:100-107 
856 4 0 |u http://dx.doi.org/10.1107/S1600577517016800  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_40 
912 |a GBV_ILN_350 
912 |a GBV_ILN_2005 
951 |a AR 
952 |d 25  |j 2018  |e Pt 1  |b 01  |c 01  |h 100-107