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231225s2017 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.7b02964
|2 doi
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|a pubmed24n0920.xml
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|a (DE-627)NLM276201582
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|a (NLM)28950064
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Marín, Lorena
|e verfasserin
|4 aut
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|a Performance Enhancement via Incorporation of ZnO Nanolayers in Energetic Al/CuO Multilayers
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|c 2017
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Completed 30.07.2018
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|a Date Revised 30.07.2018
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a Al/CuO energetic structure are attractive materials due to their high thermal output and propensity to produce gas. They are widely used to bond components or as next generation of MEMS igniters. In such systems, the reaction process is largely dominated by the outward migration of oxygen atoms from the CuO matrix toward the aluminum layers, and many recent studies have already demonstrated that the interfacial nanolayer between the two reactive layers plays a major role in the material properties. Here we demonstrate that the ALD deposition of a thin ZnO layer on the CuO prior to Al deposition (by sputtering) leads to a substantial increase in the efficiency of the overall reaction. The CuO/ZnO/Al foils generate 98% of their theoretical enthalpy within a single reaction at 900 °C, whereas conventional ZnO-free CuO/Al foils produce only 78% of their theoretical enthalpy, distributed over two distinct reaction steps at 550 °C and 850 °C. Combining high-resolution transmission electron microscopy, X-ray diffraction, and differential scanning calorimetry, we characterized the successive formation of a thin zinc aluminate (ZnAl2O4) and zinc oxide interfacial layers, which act as an effective barrier layer against oxygen diffusion at low temperature
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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|a Gao, Yuzhi
|e verfasserin
|4 aut
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|a Vallet, Maxime
|e verfasserin
|4 aut
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|a Abdallah, Iman
|e verfasserin
|4 aut
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|a Warot-Fonrose, Bénédicte
|e verfasserin
|4 aut
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|a Tenailleau, Christophe
|e verfasserin
|4 aut
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|a Lucero, Antonio T
|e verfasserin
|4 aut
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|a Kim, Jiyoung
|e verfasserin
|4 aut
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|a Esteve, Alain
|e verfasserin
|4 aut
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|a Chabal, Yves J
|e verfasserin
|4 aut
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|a Rossi, Carole
|e verfasserin
|4 aut
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 33(2017), 41 vom: 17. Okt., Seite 11086-11093
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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|g volume:33
|g year:2017
|g number:41
|g day:17
|g month:10
|g pages:11086-11093
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|u http://dx.doi.org/10.1021/acs.langmuir.7b02964
|3 Volltext
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|d 33
|j 2017
|e 41
|b 17
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|h 11086-11093
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