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231225s2017 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201606433
|2 doi
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|a pubmed24n0917.xml
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|a (DE-627)NLM275186229
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|a (NLM)28845903
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|a DE-627
|b ger
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|e rakwb
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|a eng
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|a Qu, Deshun
|e verfasserin
|4 aut
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|a Carrier-Type Modulation and Mobility Improvement of Thin MoTe2
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|c 2017
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Completed 18.07.2018
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|a Date Revised 30.09.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a A systematic modulation of the carrier type in molybdenum ditelluride (MoTe2 ) field-effect transistors (FETs) is described, through rapid thermal annealing (RTA) under a controlled O2 environment (p-type modulation) and benzyl viologen (BV) doping (n-type modulation). Al2 O3 capping is then introduced to improve the carrier mobilities and device stability. MoTe2 is found to be ultrasensitive to O2 at elevated temperatures (250 °C). Charge carriers of MoTe2 flakes annealed via RTA at various vacuum levels are tuned between predominantly pristine n-type ambipolar, symmetric ambipolar, unipolar p-type, and degenerate-like p-type. Changes in the MoTe2 -transistor performance are confirmed to originate from the physical and chemical absorption and dissociation of O2 , especially at tellurium vacancy sites. The electron branch is modulated by varying the BV dopant concentrations and annealing conditions. Unipolar n-type MoTe2 FETs with a high on-off ratio exceeding 106 are achieved under optimized doping conditions. By introducing Al2 O3 capping, carrier field effect mobilities (41 for holes and 80 cm2 V-1 s-1 for electrons) and device stability are improved due to the reduced trap densities and isolation from ambient air. Lateral MoTe2 p-n diodes with an ideality factor of 1.2 are fabricated using the p- and n-type doping technique to test the superb potential of the doping method in functional electronic device applications
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|a Journal Article
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|a MoTe2
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|a controllable doping
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|a mobility improvement
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|a unipolar transistors
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|a Liu, Xiaochi
|e verfasserin
|4 aut
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|a Huang, Ming
|e verfasserin
|4 aut
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|a Lee, Changmin
|e verfasserin
|4 aut
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|a Ahmed, Faisal
|e verfasserin
|4 aut
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|a Kim, Hyoungsub
|e verfasserin
|4 aut
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|a Ruoff, Rodney S
|e verfasserin
|4 aut
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|a Hone, James
|e verfasserin
|4 aut
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|a Yoo, Won Jong
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 29(2017), 39 vom: 07. Okt.
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:29
|g year:2017
|g number:39
|g day:07
|g month:10
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|u http://dx.doi.org/10.1002/adma.201606433
|3 Volltext
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