High-Temperature Ionic Epitaxy of Halide Perovskite Thin Film and the Hidden Carrier Dynamics

© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Détails bibliographiques
Publié dans:Advanced materials (Deerfield Beach, Fla.). - 1998. - 29(2017), 35 vom: 11. Sept.
Auteur principal: Wang, Yiping (Auteur)
Autres auteurs: Sun, Xin, Chen, Zhizhong, Sun, Yi-Yang, Zhang, Shengbai, Lu, Toh-Ming, Wertz, Esther, Shi, Jian
Format: Article en ligne
Langue:English
Publié: 2017
Accès à la collection:Advanced materials (Deerfield Beach, Fla.)
Sujets:Journal Article epitaxy halides perovskites vapor phase
Description
Résumé:© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
High-temperature vapor phase epitaxy (VPE) has been proved ubiquitously powerful in enabling high-performance electro-optic devices in III-V semiconductor field. A typical example is the successful growth of p-type GaN by VPE for blue light-emitting diodes. VPE excels as it controls film defects such as point/interface defects and grain boundary, thanks to its high-temperature processing condition and controllable deposition rate. For the first time, single-crystalline high-temperature VPE halide perovskite thin film has been demonstrated-a unique platform on unveiling previously uncovered carrier dynamics in inorganic halide perovskites. Toward wafer-scale epitaxial and grain boundary-free film is grown with alkali halides as substrates. It is shown the metal alkali halides could be used as universal substrates for VPE growth of perovskite due to their similar material chemistry and lattice constant. With VPE, hot photoluminescence and nanosecond photo-Dember effect are revealed in inorganic halide perovskite. These two phenomena suggest that inorganic halide perovskite could be as compelling as its organic-inorganic counterpart regarding optoelectronic properties and help explain the long carrier lifetime in halide perovskite. The findings suggest a new avenue on developing high-quality large-scale single-crystalline halide perovskite films requiring precise control of defects and morphology
Description:Date Completed 18.07.2018
Date Revised 01.10.2020
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201702643