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231225s2017 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201700595
|2 doi
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|a pubmed25n0910.xml
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|a DE-627
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|e rakwb
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|a eng
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| 100 |
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|a Jin, Hyeong Min
|e verfasserin
|4 aut
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|a Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning
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|c 2017
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Completed 18.07.2018
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|a Date Revised 01.10.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a One of the fundamental challenges encountered in successful incorporation of directed self-assembly in sub-10 nm scale practical nanolithography is the process compatibility of block copolymers with a high Flory-Huggins interaction parameter (χ). Herein, reliable, fab-compatible, and ultrafast directed self-assembly of high-χ block copolymers is achieved with intense flash light. The instantaneous heating/quenching process over an extremely high temperature (over 600 °C) by flash light irradiation enables large grain growth of sub-10 nm scale self-assembled nanopatterns without thermal degradation or dewetting in a millisecond time scale. A rapid self-assembly mechanism for a highly ordered morphology is identified based on the kinetics and thermodynamics of the block copolymers with strong segregation. Furthermore, this novel self-assembly mechanism is combined with graphoepitaxy to demonstrate the feasibility of ultrafast directed self-assembly of sub-10 nm nanopatterns over a large area. A chemically modified graphene film is used as a flexible and conformal light-absorbing layer. Subsequently, transparent and mechanically flexible nanolithography with a millisecond photothermal process is achieved leading the way for roll-to-roll processability
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|a Journal Article
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|a block copolymers
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|a directed self-assembly
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|a flash light
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|a photothermal effects
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|a Park, Dae Yong
|e verfasserin
|4 aut
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|a Jeong, Seong-Jun
|e verfasserin
|4 aut
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|a Lee, Gil Yong
|e verfasserin
|4 aut
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| 700 |
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|a Kim, Ju Young
|e verfasserin
|4 aut
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1 |
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|a Mun, Jeong Ho
|e verfasserin
|4 aut
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1 |
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|a Cha, Seung Keun
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Lim, Joonwon
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kim, Jun Soo
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kim, Kwang Ho
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Lee, Keon Jae
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kim, Sang Ouk
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 29(2017), 32 vom: 17. Aug.
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|g volume:29
|g year:2017
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|u http://dx.doi.org/10.1002/adma.201700595
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