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231224s2017 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.7b01068
|2 doi
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|a pubmed24n0908.xml
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|a (NLM)28585831
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|a eng
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| 100 |
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|a Shaheen, A
|e verfasserin
|4 aut
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|a Characterization of Self-Assembled Monolayers on a Ruthenium Surface
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|c 2017
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Completed 16.07.2018
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|a Date Revised 13.11.2018
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H2SO4 cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal-sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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|a Sturm, J M
|e verfasserin
|4 aut
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|a Ricciardi, R
|e verfasserin
|4 aut
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| 700 |
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|a Huskens, J
|e verfasserin
|4 aut
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|a Lee, C J
|e verfasserin
|4 aut
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|a Bijkerk, F
|e verfasserin
|4 aut
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1999
|g 33(2017), 25 vom: 27. Juni, Seite 6419-6426
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
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|g volume:33
|g year:2017
|g number:25
|g day:27
|g month:06
|g pages:6419-6426
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|u http://dx.doi.org/10.1021/acs.langmuir.7b01068
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