Strong van der Waals Adhesion of a Polymer Film on Rough Substrates

We propose that chemically inert polymeric films can enhance van der Waals (vdW) forces in the same way as nanofabrication of biomimetic adhesive materials. For the vdW adhesion of an ethylene-chlorotrifluoroethylene (ECTFE) film on rough metal and dielectric substrates, we present a model that comb...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 33(2017), 21 vom: 30. Mai, Seite 5298-5303
1. Verfasser: Klatt, Juliane (VerfasserIn)
Weitere Verfasser: Barcellona, Pablo, Bennett, Robert, Bokareva, Olga S, Feth, Hagen, Rasch, Andreas, Reith, Patrick, Buhmann, Stefan Yoshi
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2017
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't
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520 |a We propose that chemically inert polymeric films can enhance van der Waals (vdW) forces in the same way as nanofabrication of biomimetic adhesive materials. For the vdW adhesion of an ethylene-chlorotrifluoroethylene (ECTFE) film on rough metal and dielectric substrates, we present a model that combines microscopic quantum-chemistry simulations of the polymer response functions and the equilibrium monomer-substrate distance with a macroscopic quantum-electrodynamics calculation of the Casimir force between the polymer film and the substrate. We predict adhesive forces up to 2.22 kN/mm2, where the effect is reduced by substrate roughness and for dielectric surfaces 
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700 1 |a Barcellona, Pablo  |e verfasserin  |4 aut 
700 1 |a Bennett, Robert  |e verfasserin  |4 aut 
700 1 |a Bokareva, Olga S  |e verfasserin  |4 aut 
700 1 |a Feth, Hagen  |e verfasserin  |4 aut 
700 1 |a Rasch, Andreas  |e verfasserin  |4 aut 
700 1 |a Reith, Patrick  |e verfasserin  |4 aut 
700 1 |a Buhmann, Stefan Yoshi  |e verfasserin  |4 aut 
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