Multifunctional Organic-Semiconductor Interfacial Layers for Solution-Processed Oxide-Semiconductor Thin-Film Transistor

© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 29(2017), 21 vom: 17. Juni
1. Verfasser: Kwon, Guhyun (VerfasserIn)
Weitere Verfasser: Kim, Keetae, Choi, Byung Doo, Roh, Jeongkyun, Lee, Changhee, Noh, Yong-Young, Seo, SungYong, Kim, Myung-Gil, Kim, Choongik
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2017
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article copper electrodes interfacial layers oxide semiconductors solution processes thin-film transistors
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520 |a The stabilization and control of the electrical properties in solution-processed amorphous-oxide semiconductors (AOSs) is crucial for the realization of cost-effective, high-performance, large-area electronics. In particular, impurity diffusion, electrical instability, and the lack of a general substitutional doping strategy for the active layer hinder the industrial implementation of copper electrodes and the fine tuning of the electrical parameters of AOS-based thin-film transistors (TFTs). In this study, the authors employ a multifunctional organic-semiconductor (OSC) interlayer as a solution-processed thin-film passivation layer and a charge-transfer dopant. As an electrically active impurity blocking layer, the OSC interlayer enhances the electrical stability of AOS TFTs by suppressing the adsorption of environmental gas species and copper-ion diffusion. Moreover, charge transfer between the organic interlayer and the AOS allows the fine tuning of the electrical properties and the passivation of the electrical defects in the AOS TFTs. The development of a multifunctional solution-processed organic interlayer enables the production of low-cost, high-performance oxide semiconductor-based circuits 
650 4 |a Journal Article 
650 4 |a copper electrodes 
650 4 |a interfacial layers 
650 4 |a oxide semiconductors 
650 4 |a solution processes 
650 4 |a thin-film transistors 
700 1 |a Kim, Keetae  |e verfasserin  |4 aut 
700 1 |a Choi, Byung Doo  |e verfasserin  |4 aut 
700 1 |a Roh, Jeongkyun  |e verfasserin  |4 aut 
700 1 |a Lee, Changhee  |e verfasserin  |4 aut 
700 1 |a Noh, Yong-Young  |e verfasserin  |4 aut 
700 1 |a Seo, SungYong  |e verfasserin  |4 aut 
700 1 |a Kim, Myung-Gil  |e verfasserin  |4 aut 
700 1 |a Kim, Choongik  |e verfasserin  |4 aut 
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773 1 8 |g volume:29  |g year:2017  |g number:21  |g day:17  |g month:06 
856 4 0 |u http://dx.doi.org/10.1002/adma.201607055  |3 Volltext 
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