Improved environmental stability for plasma enhanced chemical vapor deposition SiO2 waveguides using buried channel designs
Ridge and buried channel waveguides (BCWs) made using plasma-enhanced chemical vapor deposition SiO2 were fabricated and tested after being subjected to long 85°C water baths. The water bath was used to investigate the effects of any water absorption in the ridge and BCWs. Optical mode spreading and...
Ausführliche Beschreibung
Bibliographische Detailangaben
Veröffentlicht in: | Optical engineering (Redondo Beach, Calif.). - 1986. - 55(2016), 4 vom: 06. Apr.
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1. Verfasser: |
Wall, Thomas A
(VerfasserIn) |
Weitere Verfasser: |
Chu, Roger P,
Parks, Joshua W,
Ozcelik, Damla,
Schmidt, Holger,
Hawkins, Aaron R |
Format: | Online-Aufsatz
|
Sprache: | English |
Veröffentlicht: |
2016
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Zugriff auf das übergeordnete Werk: | Optical engineering (Redondo Beach, Calif.)
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Schlagworte: | Journal Article
integrated waveguides
plasma enhanced chemical vapor deposition
silicon dioxide
water absorption
waveguide lifetime |