Atomically Thin Hexagonal Boron Nitride Nanofilm for Cu Protection : The Importance of Film Perfection

Détails bibliographiques
Publié dans:	Advanced materials (Deerfield Beach, Fla.). - 1998. - 29(2017), 4 vom: 01. Jan.
Auteur principal:	Khan, Majharul Haque (Auteur)
Autres auteurs:	Jamali, Sina S, Lyalin, Andrey, Molino, Paul J, Jiang, Lei, Liu, Hua Kun, Taketsugu, Tetsuya, Huang, Zhenguo
Format:	Article en ligne
Langue:	English
Publié:	2017
Accès à la collection:	Advanced materials (Deerfield Beach, Fla.)
Sujets:	Journal Article DFT calculations anticorrosion electrochemistry hexagonal boron nitride nanofilms


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100	1		\|a Khan, Majharul Haque \|e verfasserin \|4 aut
245	1	0	\|a Atomically Thin Hexagonal Boron Nitride Nanofilm for Cu Protection \|b The Importance of Film Perfection
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336			\|a Text \|b txt \|2 rdacontent
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500			\|a Date Completed 18.07.2018
500			\|a Date Revised 30.09.2020
500			\|a published: Print-Electronic
500			\|a Citation Status PubMed-not-MEDLINE
520			\|a © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
520			\|a Outstanding protection of Cu by high-quality boron nitride nanofilm (BNNF) 1-2 atomic layers thick in salt water is observed, while defective BNNF accelerates the reaction of Cu toward water. The chemical stability, insulating nature, and impermeability of ions through the BN hexagons render BNNF a great choice for atomic-scale protection
650		4	\|a Journal Article
650		4	\|a DFT calculations
650		4	\|a anticorrosion
650		4	\|a electrochemistry
650		4	\|a hexagonal boron nitride
650		4	\|a nanofilms
700	1		\|a Jamali, Sina S \|e verfasserin \|4 aut
700	1		\|a Lyalin, Andrey \|e verfasserin \|4 aut
700	1		\|a Molino, Paul J \|e verfasserin \|4 aut
700	1		\|a Jiang, Lei \|e verfasserin \|4 aut
700	1		\|a Liu, Hua Kun \|e verfasserin \|4 aut
700	1		\|a Taketsugu, Tetsuya \|e verfasserin \|4 aut
700	1		\|a Huang, Zhenguo \|e verfasserin \|4 aut
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