Significant Radiation Tolerance and Moderate Reduction in Thermal Transport of a Tungsten Nanofilm by Inserting Monolayer Graphene

© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 29(2017), 3 vom: 23. Jan.
1. Verfasser: Si, Shuyao (VerfasserIn)
Weitere Verfasser: Li, Wenqing, Zhao, Xiaolong, Han, Meng, Yue, Yanan, Wu, Wei, Guo, Shishang, Zhang, Xingang, Dai, Zhigao, Wang, Xinwei, Xiao, Xiangheng, Jiang, Changzhong
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2017
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article graphene multilayer nanofilms radiation tolerance thermal resistance
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520 |a Tungsten-graphene multilayer composites are fabricated using a stacking method. The thermal resistance induced by the graphene interlayer is moderate. An ion-implantation method is used to verify the radiation tolerance. The results show that graphene inserted among tungsten films plays a dominant role in reducing radiation damage. Furthermore, the performance of different tungsten period-thicknesses in radiation tolerance is systematically analyzed 
650 4 |a Journal Article 
650 4 |a graphene 
650 4 |a multilayer nanofilms 
650 4 |a radiation tolerance 
650 4 |a thermal resistance 
700 1 |a Li, Wenqing  |e verfasserin  |4 aut 
700 1 |a Zhao, Xiaolong  |e verfasserin  |4 aut 
700 1 |a Han, Meng  |e verfasserin  |4 aut 
700 1 |a Yue, Yanan  |e verfasserin  |4 aut 
700 1 |a Wu, Wei  |e verfasserin  |4 aut 
700 1 |a Guo, Shishang  |e verfasserin  |4 aut 
700 1 |a Zhang, Xingang  |e verfasserin  |4 aut 
700 1 |a Dai, Zhigao  |e verfasserin  |4 aut 
700 1 |a Wang, Xinwei  |e verfasserin  |4 aut 
700 1 |a Xiao, Xiangheng  |e verfasserin  |4 aut 
700 1 |a Jiang, Changzhong  |e verfasserin  |4 aut 
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