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231224s2016 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201604318
|2 doi
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|a eng
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| 100 |
1 |
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|a Ito, Yoshikazu
|e verfasserin
|4 aut
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| 245 |
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|a Correlation between Chemical Dopants and Topological Defects in Catalytically Active Nanoporous Graphene
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|c 2016
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|a Text
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|a ƒaComputermedien
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|a Date Completed 17.07.2018
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|a Date Revised 01.10.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a The interplay between chemical dopants and topological defects plays a crucial role in electrocatalysis of doped graphene. By systematically tuning the curvatures, thereby the density of topological defects, of 3D nanoporous graphene, the intrinsic correlation of topological defects with chemical doping contents and dopant configurations is revealed, shining lights into the structural and chemical origins of HER activities of graphene
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|a Journal Article
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|a chemical vapor deposition
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|a hydrogen evolution reaction
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|a nanoparticles
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|a nanoporous graphene
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|a nitrogen-sulfur-phosphorus co-doping
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|a Shen, Yuhao
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Hojo, Daisuke
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Itagaki, Yoji
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Fujita, Takeshi
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Chen, Linghan
|e verfasserin
|4 aut
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|a Aida, Tsutomu
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| 700 |
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|a Tang, Zheng
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|a Adschiri, Tadafumi
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|a Chen, Mingwei
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|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
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|g 28(2016), 48 vom: 14. Dez., Seite 10644-10651
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