Hybrid van der Waals p-n Heterojunctions based on SnO and 2D MoS2

© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 28(2016), 41 vom: 12. Nov., Seite 9133-9141
1. Verfasser: Wang, Zhenwei (VerfasserIn)
Weitere Verfasser: He, Xin, Zhang, Xi-Xiang, Alshareef, Husam N
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2016
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article MoS2 SnO electrostatic force microscopy gate-tunable van der Waals heterojunctions
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520 |a A p-type oxide/2D hybrid van der Waals p-n heterojunction is demonstrated for the first time between SnO (tin monoxide) (the p-type oxide) and 2D MoS2 (molybdenum disulfide), showing an ideality factor of 2 and rectification ratio up to 104 . The reported heterojunction is gate-tunable with typical anti-ambipolar transfer characteristics. Surface potential mapping is performed and a current model for such a heterojunction is proposed 
650 4 |a Journal Article 
650 4 |a MoS2 
650 4 |a SnO 
650 4 |a electrostatic force microscopy 
650 4 |a gate-tunable 
650 4 |a van der Waals heterojunctions 
700 1 |a He, Xin  |e verfasserin  |4 aut 
700 1 |a Zhang, Xi-Xiang  |e verfasserin  |4 aut 
700 1 |a Alshareef, Husam N  |e verfasserin  |4 aut 
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