EUV-induced oxidation of carbon on TiO2
Previously we reported estimates of the maximum etch rates of C on TiO2 by oxidizers including NO, O3 and H2O2 when irradiated by a spatially-non-uniform beam of extreme ultraviolet (EUV) radiation at 13.5 nm (Faradzhev et al., 2013). Here we extend that work by presenting temporally and spatially r...
| Veröffentlicht in: | Surface science. - 1997. - 652(2016) vom: 20. Okt., Seite 200-205 |
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| Format: | Aufsatz |
| Sprache: | English |
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2016
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| Zugriff auf das übergeordnete Werk: | Surface science |
| Schlagworte: | Journal Article Carbon etching Extreme ultraviolet Hydrogen peroxide Photo-oxidation Strong oxidizer TiO2 |