Self-Assembly of Oligosaccharide-b-PMMA Block Copolymer Systems : Glyco-Nanoparticles and Their Degradation under UV Exposure
This paper discusses the self-assembly of oligosaccharide-containing block copolymer and the use of ultraviolet (UV) to obtain nanoporous glyco-nanoparticles by photodegradation of the synthetic polymer block. Those glyco-nanoparticles consisting of oligosaccharide-based shell and a photodegradable...
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 32(2016), 18 vom: 10. Mai, Seite 4538-45
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| 1. Verfasser: |
Zepon, Karine M
(VerfasserIn) |
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| Weitere Verfasser: |
Otsuka, Issei,
Bouilhac, Cécile,
Muniz, Edvani C,
Soldi, Valdir,
Borsali, Redouane |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2016
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article
Research Support, Non-U.S. Gov't |
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