A technology center for the production of high-precision reflection gratings has been established. Within this project a new optics beamline and a versatile reflectometer for at-wavelength characterization of UV- and XUV-reflection gratings and other (nano-) optical elements has been set up at BESSY...
Détails bibliographiques
| Publié dans: | Journal of synchrotron radiation. - 1994. - 23(2016), 1 vom: 25. Jan., Seite 67-77
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| Auteur principal: |
Schäfers, F
(Auteur) |
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| Autres auteurs: |
Bischoff, P,
Eggenstein, F,
Erko, A,
Gaupp, A,
Künstner, S,
Mast, M,
Schmidt, J-S,
Senf, F,
Siewert, F,
Sokolov, A,
Zeschke, Th |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2016
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| Accès à la collection: | Journal of synchrotron radiation
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| Sujets: | Journal Article
Research Support, Non-U.S. Gov't
XUV optical elements
at-wavelength metrology
c-PGM beamline
diffraction gratings
polarimetry
reflectivity
reflectometer |
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