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231224s2016 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.5b03958
|2 doi
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|a pubmed24n0851.xml
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|a (NLM)26651873
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|a DE-627
|b ger
|c DE-627
|e rakwb
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| 041 |
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|a eng
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| 100 |
1 |
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|a Yamazoe, Hironori
|e verfasserin
|4 aut
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| 245 |
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|a Changes in Cell Adhesiveness and Physicochemical Properties of Cross-Linked Albumin Films after Ultraviolet Irradiation
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|c 2016
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Completed 17.10.2016
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|a Date Revised 30.12.2016
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a We discovered the unique cell adhesive properties of ultraviolet (UV)-irradiated albumin films. Albumin films prepared using a cross-linking reagent with epoxy groups maintained native albumin properties, such as resistance to cell adhesion. Interestingly, the cell adhesive properties of films varied depending upon the UV irradiation time; specifically, cell adhesiveness increased until 2 h of UV irradiation, when the cell number attached to the film was similar to that of culture dishes, and then cell adhesiveness decreased until 20 h of UV irradiation, after which the surface returned to the initial non-adhesive state. To elucidate the molecular mechanisms underlying this phenomenon, we examined the effect of UV irradiation on albumin film properties. The following changes occurred in response to UV irradiation: decreased α-helical structure, cleavage of albumin peptide bonds, and increased hydrophilicity and oxygen content of the albumin film surface. In addition, we found a positive correlation between the degree of cell adhesion and the amount of fibronectin adsorbed on the film. Taken together, UV-induced changes in films highly affect the amount of cell adhesion proteins adsorbed on the films depending upon the irradiation time, which determines cell adhesion behavior
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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|a Albumins
|2 NLM
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|a Membranes, Artificial
|2 NLM
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|a Nakanishi, Hisashi
|e verfasserin
|4 aut
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|a Kashiwagi, Yukiyasu
|e verfasserin
|4 aut
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|a Nakamoto, Masami
|e verfasserin
|4 aut
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|a Tachibana, Akira
|e verfasserin
|4 aut
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|a Hagihara, Yoshihisa
|e verfasserin
|4 aut
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| 700 |
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|a Tanabe, Toshizumi
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 32(2016), 1 vom: 12. Jan., Seite 203-10
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
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|g volume:32
|g year:2016
|g number:1
|g day:12
|g month:01
|g pages:203-10
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|u http://dx.doi.org/10.1021/acs.langmuir.5b03958
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