H₂O Dissociation-Induced Aluminum Oxide Growth on Oxidized Al(111) Surfaces
The interaction of water vapor with amorphous aluminum oxide films on Al(111) is studied using X-ray photoelectron spectroscopy to elucidate the passivation mechanism of the oxidized Al(111) surfaces. Exposure of the aluminum oxide film to water vapor results in self-limiting Al2O3/Al(OH)3 bilayer f...
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 31(2015), 48 vom: 08. Dez., Seite 13117-26 |
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| Auteur principal: | |
| Autres auteurs: | , |
| Format: | Article en ligne |
| Langue: | English |
| Publié: |
2015
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids |
| Sujets: | Journal Article Research Support, U.S. Gov't, Non-P.H.S. Water 059QF0KO0R Aluminum Oxide LMI26O6933 |
| Accès en ligne |
Volltext |