Wafer-Scale Precise Patterning of Organic Single-Crystal Nanowire Arrays via a Photolithography-Assisted Spin-Coating Method

Wafer-Scale Precise Patterning of Organic Single-Crystal Nanowire Arrays via a Photolithography-Assisted Spin-Coating Method

© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 27(2015), 45 vom: 02. Dez., Seite 7305-12
1. Verfasser: Deng, Wei (VerfasserIn)
Weitere Verfasser: Zhang, Xiujuan, Wang, Liang, Wang, Jincheng, Shang, Qixun, Zhang, Xiaohong, Huang, Liming, Jie, Jiansheng
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2015
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article nanowire arrays organic single crystals photolithography precise patterning spin coating
Beschreibung
Zusammenfassung:© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
A photolithography-assisted spin-coating approach is developed to produce single-crystal organic nanowire (NW) arrays at designated locations with high precision and high efficiency. This strategy enables the large-scale fabrication of organic NW arrays with nearly the same accuracy, reliability, and flexibility as photolithography. The high mobilities of the organic NWs enable the control of the switch of multicolored light-emitting devices with good stability
Beschreibung:Date Completed 23.03.2016
Date Revised 01.10.2020
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201503019